ALIGNER, MICRODEVICE, PHOTOMASK, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE

摘要

A stitching aligner which projects the image of a pattern of a reticle (Ri) onto different regions of the surface of a substrate (4) successively in such a way that the images overlap with each other. A density filter (Fj) with a dimming unit which gradually reduces luminous power applied to an overlap part in which the images of the pattern overlap with each other is provided near the reticle (Ri). The density filter (Fj) is supported by a filter stage (FS) which adjusts the posture of the density filter (Fj). The posture of the density filter (Fj) is measured by an illuminance unevenness sensor (126) or the like on a substrate stage (6) and matched with the posture of the reticle (Ri) by the filter stage (FS).