| 摘要 |
<p>Magnetic polishing fluid (MPF) compositions comprising various size colloidal and/or non-colloidal magnetic particle and colloidal size polishing particle compositions suitable for polishing ceramic and glass substrates are described. The compositions are usually aqueous compositions having very basic pHs. Magnetic polishing fluid compositions for polishing metal substrates containing colloidal and/or non-colloidal magnetic particles are also described. These latter compositions contain oxidizers and, usually, oxidation inhibitors for assisting in the polishing process. The MPFs usually include colloidal polishing particles. MPF compositions for polishing metals are usually highly acidic aqueous compositions. Methods for preparing the various MPF compositions are described.</p> |
