METHOD FOR MANUFACTURING ANTI-REFLECTIVE LAYER

摘要

PURPOSE: A method for manufacturing an anti-reflective layer is provided to guarantee uniformity and repeatability of the anti-reflective layer, by forming the anti-reflective layer not by an evaporation process but by an ion injection process. CONSTITUTION: A conductive layer and a mask material layer are sequentially formed on a semiconductor device. An anti-reflective layer is manufactured on the material layer to easily form a photoresist pattern for etching the conductive layer and material layer. In a method for forming the anti-reflective layer, the anti-reflective layer is formed by injecting impurity ions into the material layer.