发明名称 Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatus
摘要 <p>A reference frame provided in a vacuum chamber is supported by support pillars extending through and isolated from the vacuum chamber walls to isolate the reference frame from vibrations in the vacuum chamber. The gap between the support pillar and the vacuum chamber wall may be sealed by a low-stiffness seal. The low stiffness seal may be a three part seal allowing relative motion in six-degrees of freedom. &lt;IMAGE&gt;</p>
申请公布号 EP1052553(A2) 申请公布日期 2000.11.15
申请号 EP20000303229 申请日期 2000.04.17
申请人 ASML NETHERLANDS B.V. 发明人 DRIESSEN, JOHANNES CORNELIS;BISSCHOPS, THEODORUS HUBERTUS JOSEPHUS;VIJFVINKEL, JAKOB;DONA, MARINUS JOSEPHUS JAKOBUS;MEUWESE, MARK THEO;SCHNEIDER, RONALD MAARTEN;MORS, MICHEL ALEXANDER;VISSER, HUGO MATTHIEU
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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