METHOD FOR CONTROLLING FOREIGN SUBSTANCE OF APPARATUS FOR EVAPORATING NITRIDE LAYER

摘要

PURPOSE: A method for controlling a foreign substance of an apparatus for evaporating a nitride layer is provided to control the foreign substance generated in an evaporation furnace, by increasing the temperature of the evaporation furnace higher than a processing temperature in every process except the process for evaporating the nitride layer. CONSTITUTION: A wafer in a carrier is loaded on a boat, and the boat is transferred into an evaporation furnace maintaining a processing temperature of 760°C to evaporate a nitride layer on the wafer. The boat is transferred to the exterior of the evaporation furnace while having the evaporation furnace maintain the processing temperature. The wafer mounted on the boat is transferred to the carrier, and the temperature of the evaporation furnace is increased to 800°C to eliminate a foreign substance in the evaporation furnace.