发明名称 |
FABRICATION METHOD OF HIGH APERTURE RATE AND HIGH TRANSMISSIBILITY LCD |
摘要 |
PURPOSE: A fabrication method of high aperture rate and high transmissibility LCD is provided to decrease the number of mask processes to shorten time required to the process and enhance productivity. CONSTITUTION: A fabrication method of high aperture rate and high transmissibility LCD comprises steps of: depositing a transparent conductive film on a substrate and patterning a portion of the film to form counter electrodes; forming gate bus lines, common electrode lines and gate pads; defining a TFT area; forming source and drain electrodes on the area and forming data pads; forming an insulation layer and opening the data pads and gate pads; and forming a transparent conductive film and patterning a portion of the film to form pixel electrodes.
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申请公布号 |
KR20000066006(A) |
申请公布日期 |
2000.11.15 |
申请号 |
KR19990012823 |
申请日期 |
1999.04.12 |
申请人 |
HYUNDAI ELECTRONICS IND. CO.,LTD |
发明人 |
KIM, HYANG YUL;LEE, SEUNG HUI;JUNG, YEON HAK |
分类号 |
G02F1/136;G02F1/1343;(IPC1-7):G02F1/136;G02F1/134 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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