发明名称 FABRICATION METHOD OF HIGH APERTURE RATE AND HIGH TRANSMISSIBILITY LCD
摘要 PURPOSE: A fabrication method of high aperture rate and high transmissibility LCD is provided to decrease the number of mask processes to shorten time required to the process and enhance productivity. CONSTITUTION: A fabrication method of high aperture rate and high transmissibility LCD comprises steps of: depositing a transparent conductive film on a substrate and patterning a portion of the film to form counter electrodes; forming gate bus lines, common electrode lines and gate pads; defining a TFT area; forming source and drain electrodes on the area and forming data pads; forming an insulation layer and opening the data pads and gate pads; and forming a transparent conductive film and patterning a portion of the film to form pixel electrodes.
申请公布号 KR20000066006(A) 申请公布日期 2000.11.15
申请号 KR19990012823 申请日期 1999.04.12
申请人 HYUNDAI ELECTRONICS IND. CO.,LTD 发明人 KIM, HYANG YUL;LEE, SEUNG HUI;JUNG, YEON HAK
分类号 G02F1/136;G02F1/1343;(IPC1-7):G02F1/136;G02F1/134 主分类号 G02F1/136
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