发明名称 |
SUBSTRATE SUPPORT FOR SiC EPITAXY AND METHOD FOR PRODUCING AN INSERT FOR A SUSCEPTOR |
摘要 |
A device for mounting a substrate includes a susceptor as a support for the substrate to be coated. The susceptor includes an insert whose surface is at least partly formed by a metal carbide layer of a predetermined thickness. The device for mounting the substrate eliminates a contamination of the substrate during processing, such as during production of an epitaxial layer on a wafer. A method for producing the insert includes the steps of producing a metallic preform, embedding the metallic preform in a carbon-containing powder, heating the metallic preform and the carbon-containing powder to an elevated temperature, hard processing the heat-treated preform and disposing the hard-processed preform on the susceptor as an insert. |
申请公布号 |
EP1051535(A2) |
申请公布日期 |
2000.11.15 |
申请号 |
EP19990907245 |
申请日期 |
1999.01.18 |
申请人 |
SICED ELECTRONICS DEVELOPMENT GMBH & CO. KG |
发明人 |
RUPP, ROLAND;WIEDENHOFER, ARNO |
分类号 |
C30B25/02;C30B25/12;H01L21/68;H01L21/687 |
主分类号 |
C30B25/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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