METHOD FOR MANUFACTURING REFLECTION TYPE ACTIVE MATRIX SUBSTRATE CELL

摘要

PURPOSE: A method for manufacturing a reflection type active matrix substrate cell is provided to maintain uniformly the luminance of a reflective beam by forming a concavo-convex face on a reflective layer. CONSTITUTION: A method for manufacturing a reflection type active matrix substrate cell comprises the steps of: forming a gate electrode layer(2) and a gate insulating layer(3) on a base plate(1); forming an active pattern(4) on the gate insulating layer corresponding to the gate electrode layer; forming a source and a drain electrode layer(5,6) on the gate insulating layer and patterning the source and the drain electrode layers to expose a channel part of the active layer and a part of the gate insulating layer; forming a passivation layer(7) on the gate insulating layer; patterning the passivation layer to expose a part of the drain electrode layer and forming a reflective layer(8) on the passivation layer; forming a concavo-convex face on a predetermined area of the reflective layer and covering a metal oxide layer between the concavo-convex face.