| 摘要 |
PURPOSE: A novel type sputtering device is provided to prevent the corrosion of a specific portion of a metal target. CONSTITUTION: A magnet(228) for applying a certain electric force on a metal target and placed on a base plate(204) is connected with an elastic member(spring)(230) to move in radial on the base plate along a recessed face(226) formed in a certain size and width. When the base plate rotates, the magnet moves toward the circumference of the base plate by the centrifugal force. The magnetic field formed by the moving magnet is movable. According to the formation of the electromagnetic field, plasma of high density is created.
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