| 摘要 |
PURPOSE: An exposure system of a semiconductor wafer is provided to simplify an exposure equipment and to reduce a cost, by dividing the light emitted from a light source into two exposure light sources for a wafer pattern and an edge exposure of the patterned wafer using a beam splitter. CONSTITUTION: In an exposure system of a semiconductor wafer(210,252), the driving unit comprises a first shutter(202), a second shutter(214), an illuminance detecting block, a wafer existence detecting block, a control block, a first shutter driving block and a second shutter driving block. The first shutter passes the light reflected from a beam splitter through an opening to be sent to an exposure system for forming a pattern. The second shutter passes the light reflected from a beam splitter through an opening to be sent to a wafer edge exposure system. The illuminance detecting block detects an illuminance energy value of a lamp for an exposure light source. The wafer existence detecting block detects if a wafer exists on a vacuum chuck(253) for fixing the patterned wafer. The control block supplies a switching operation control signal of the second shutter according to the wafer existence detecting signal and a switching operation control signal of the first shutter. The first shutter driving block turns on/off the opening of the first shutter according to the control of the control block. The second shutter driving block turns on/off the opening of the second shutter according to the control of the control block. |
