| 摘要 |
PURPOSE: A fuse element is provided to be adapted to obtain a process margin and make a design area to be minimal by forming the fuse element in a multi-layer structure. CONSTITUTION: A fuse element comprises a first insulating film formed on a wafer, a plural of first fuse element patterned on the upper portion of the first insulating film at a distance, a second insulating film formed on the upper portion of the first insulating film including the first fuse element, and a plural of second fuse element patterned on the upper portion of the second insulating film on the area spaced away between the first fuse elements. Such a fuse element is applied to word and data lines of memory, respectively.
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