| 摘要 |
PURPOSE: A method for fabricating an MO(Magneto-Optical) recording medium is provided to change each pressure in a dielectric film generating process, and to perform a sputter etching on the first dielectric film surface, so as to enhance the smoothness of a recording film interface, and a recording sensitivity. CONSTITUTION: The first dielectric film(2), a recording film(3), the second dielectric film(4) and a reflection film(5) are sequentially performed on a substrate(1). One film forming the first dielectric film(2) is generated by a high process pressure. The other film forming the first dielectric film(2) is generated by a low process pressure. One film forming the second dielectric film(4) is generated by a low process pressure. The other film forming the second dielectric film(4) is generated by a high process pressure. Each film forming the first dielectric film(2) has an equal thickness.
|
