| 摘要 |
PROBLEM TO BE SOLVED: To provide a smear eliminating apparatus and a smear eliminating method which can eliminate smears effectively, without residue of smears. SOLUTION: In a smear eliminating method of a substrate, which eliminates smear left on a conducting film of the bottom part of a via hole formed in a substrate, by using plasma treatment, a substrate 4 is mounted on a lower electrode arranged facing an upper electrode, plasma generating gas containing oxygen is supplied in a treatment chamber between the lower electrode and the upper electrode, a high-frequency voltage is applied across the lower electrode and the upper electrode, and plasma treatment is performed in the condition that a distance D between the upper electrode and the lower electrode is at most 10 mm and the partial pressure of oxygen in the plasma generating gas is in the range of 100 to 10,000 Pa. Thereby ions generated by plasma are made to enter an object surface to be treated isotropically, and residue of smears can be reduced.
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