发明名称 Cathode structure for reduced emission and robust handling properties
摘要 A photocathode device for use in an image intensifier, fabricated with a photoemissive semiconductor wafer having an active cathode layer which includes a central region of a first predetermined height surrounded by a peripheral region of a second predetermined height. The first predetermined height of the central region is configured to be greater than the second predetermined height of the peripheral region in order to create a recessed contact structure which is less likely to have unwanted emission points. A layer of conductive material covers the peripheral region to provide an electrical contact to the photocathode device. A layer of insulating material covers the layer of conductive material in order to protect the contact layer from being damage during handling operations.
申请公布号 US6146229(A) 申请公布日期 2000.11.14
申请号 US19980080424 申请日期 1998.05.18
申请人 ITT INDUSTRIES, INC. 发明人 SMITH, ARLYNN W.;VRESCAK, WARREN DAVID
分类号 H01J1/34;H01J9/12;(IPC1-7):H01J9/02 主分类号 H01J1/34
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