| 摘要 |
PCT No. PCT/EP97/01838 Sec. 371 Date Oct. 21, 1998 Sec. 102(e) Date Oct. 21, 1998 PCT Filed Apr. 12, 1997 PCT Pub. No. WO97/39840 PCT Pub. Date Oct. 30, 1997An apparatus for the processing of substrates in a fluid tank is provided. The fluid tank has at least one fluid inlet opening and at least one overflow opening in the upper region of at least one side wall of the fluid tank. Optimum adaptation to fluid circulation rates is provided by at least one slide having a variable position relative to the overflow opening for varying the opening area thereof. This opening area is smaller during introduction of gas than during a preceding rinsing process.
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