发明名称 GAS-BARRIER FILM AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a gas-barrier film having a strong gas-barrier layer at a temperature lower than a conventional temperature. SOLUTION: A method for producing a gas-barrier film by a method in which at least on one side of a base material, the gas-barrier film in which a layer containing a metal alkoxide expressed by formula r1x, R2y, R3z M(OR)m-(x+y+z) (R1, R2, R3 are each alkyl group or a hydrocarbon group having various functional groups; R is a general alkyl group; M is metal; m is the valence number of M; 0<=x,y,z<=3.0<x+y+z<m) or the ring opening reaction product of its hydrolysis product is installed and the layer containing the metal alkoxide or its hydrolysis product is installed at least on one side of the base material for producing the gas barrier film are formed, and electromagnetic waves are emitted in this process is provided.
申请公布号 JP2000313087(A) 申请公布日期 2000.11.14
申请号 JP19990124161 申请日期 1999.04.30
申请人 TOPPAN PRINTING CO LTD 发明人 KANETAKA TAKESHI;MATSUO RYUKICHI;KITAHARA RIRI;HAYASHI KENJI
分类号 B32B9/00;(IPC1-7):B32B9/00 主分类号 B32B9/00
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