发明名称 |
Modified chemical vapor deposition using independently controlled thermal sources |
摘要 |
The deposition rate of MCVD processes is enhanced by applying at least a first and a second independently controlled heat source to a plurality of reactants which are used to form deposited particulate matter. The first heat source is adjusted so as to provide at least a specified rate of reaction for the reactants, and the second source is adjusted so as to provide at least a specified deposition rate for the particulate matter.
|
申请公布号 |
US6145345(A) |
申请公布日期 |
2000.11.14 |
申请号 |
US19980092380 |
申请日期 |
1998.06.05 |
申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
MARSZALEK, STANLEY F.;NELSON, KATHERINE THERESA;WALKER, KENNETH LEE;WOMACK, KIM WILLARD;YAN, MAN FEI |
分类号 |
C03B37/018;(IPC1-7):C23C16/40 |
主分类号 |
C03B37/018 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|