| 摘要 |
PROBLEM TO BE SOLVED: To provide a sheet resistance measuring instrument capable assembled easily in an existing production line, capable of measuring sheet resistance of a thin film in line, and capable of control properly film quality of the thin film. SOLUTION: This device is provided with a sensor head l for generating a magnetic field, and an amplifier 2 for detecting a variation of the magnetic field generated by the sensor head 1 as sheet resistance of a thin film formed on a semiconductor wafer 101, when the semiconductor wafer 101 of a measuring object is arranged with a prescribed distance with respect to the sensor head 1. The sensor head 1 is provided to face to only one side face of the semiconductor wafer 101.
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