| 摘要 |
PROBLEM TO BE SOLVED: To detect a dust particle full-automatically at high speed and high accuracy by detecting a dust particle in a specified region on a substrate using a dust particle detecting means within the time required for a processing means to process the substrate and monitoring the generating state of dust particle based on that data. SOLUTION: In a mass production line of substrate, e.g. semiconductor, comprising a plurality of processing units, a dust particle monitoring unit comprising an oblique illumination system 3151 having an illumination array, a focus optical system 3153 having a lens array or a microlens group, a spatial filter 3154 arranged on the Fourier transform plane of the focus optical system 3153, and a detector 3155 arranged at the focus position of the focus optical system 3153 is disposed at the inlet or outlet of a specified processing unit or in the carrying system between the plurality of processing units and the generating state of dust particle on the substrate is detected within the processing time of the processing means. Defect due to dust particle thus generated is then analyzed based on the detection results. |
