发明名称 METHOD FOR INSPECTING THIN FILM SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To judge the propriety of thin film transistors from the change of a current value by applying a standard voltage between each source and drain and between each gate and source of two thin film transistors, and then shifting one voltage in a current increasing direction. SOLUTION: Analog switches SW1A, SW2B are composed of an n-channel MOS transistor and a p-channel MOS transistor respectively. In the case of source-drain voltage Vds=1OV, for instance, source-drain current Ids is 1×10-8 A at gate-source voltage Vgs=OV, while in the p-channel MOS transistor with an off-leak failure, the current Ids is about 1×10-8 A at voltage Vgs=0V. With this difference, it is hard to discriminate a circuit insulation failure and a transistor failure from each other. Voltage Vds is therefore changed to 9V, or voltage Vqs is changed to -1V to compare the current Ids with the normal one. The current Ids thereby changes large to 1×10-6 to 1×10-4 A to specify the transistor failure.</p>
申请公布号 JP2000314758(A) 申请公布日期 2000.11.14
申请号 JP19990124808 申请日期 1999.04.30
申请人 TOSHIBA CORP 发明人 TOMITA AKIRA
分类号 H01L29/786;G01R31/26;G01R31/28;G01R31/316;G02F1/136;G02F1/1365;G02F1/1368;(IPC1-7):G01R31/26 主分类号 H01L29/786
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