| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method and apparatus, which reduce residue particles on a substrate face after cleaned and attain synthetic cleaning effects of reduction in a residue organic substance, etc. SOLUTION: A substrate cleaner in a semiconductor manufacture comprises, under the same environment managing a clean level, an optical process part for decomposing a contamination on the surface of a substrate by a chemical reaction, and a water cleaning part and substrate drying part for eliminating a residue substance on the surface of the substrate by a physical external pressure, and after a face of the semiconductor substrate is irradiated with ultraviolet ray lamp in the optical process part for an optical reaction (optical decomposition) of the contamination of the surface of the substrate, by brush rubbing, megasonic water cleaning, high-pressure spray water cleaning, or the like as a physical external pressure method, the residue substance on the substrate face after optically decomposed is eliminated, thereby purifying the face of the semiconductor substrate.
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