发明名称 |
Ester compounds, polymers, resist composition and patterning process |
摘要 |
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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申请公布号 |
US6147249(A) |
申请公布日期 |
2000.11.14 |
申请号 |
US19990307767 |
申请日期 |
1999.05.10 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE, TAKERU;KINSHO, TAKESHI;NISHI, TSUNEHIRO;NAKASHIMA, MUTSUO;HASEGAWA, KOJI;HATAKEYAMA, JUN |
分类号 |
C07C69/03;C07C69/00;C07C69/753;C08F32/08;G03F7/004;G03F7/039;(IPC1-7):C07C69/74 |
主分类号 |
C07C69/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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