发明名称 |
SELF-ALIGNED SOURCE AND DRAIN EXTENSIONS FABRICATED IN A DAMASCENE CONTACT AND GATE PROCESS |
摘要 |
A method of fabricating a transistor having shallow source and drain extensions utilizes a self-aligned contact. The drain extensions are provided through an opening between a contact area and the gate structure. A high-k gate dielectric material can be utilized. P-MOS and N-MOS transistors can be created according to the disclosed method.
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申请公布号 |
WO0067322(A2) |
申请公布日期 |
2000.11.09 |
申请号 |
WO2000US05157 |
申请日期 |
2000.02.29 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
XIANG, QI;BUYNOSKI, MATTHEW, S.;LIN, MING-REN |
分类号 |
H01L21/28;H01L21/336;H01L21/8238;H01L27/092;H01L29/423;H01L29/43;H01L29/45;H01L29/49;H01L29/78;(IPC1-7):H01L27/00 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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