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发明名称
高氧低温式颅脑损伤治疗装置
摘要
本实用新型提供了一种高氧低温式颅脑损伤治疗装置,它有颅脑罩,颅脑罩扣合在底板上,颅脑罩上分别设置有与其内腔相通的进氧口、进冷口、阀门,颅脑罩上设置有开口。它与现有的氧气、冷气源相接后,能够在本实用新型内形成一个可以随意调节的高氧、低温环境,患者的头部在此环境内,能够对其进行均匀供氧、降温,它操作简便、治疗费用较低。
申请公布号
CN2404511Y
申请公布日期
2000.11.08
申请号
CN99247423.X
申请日期
1999.12.13
申请人
王成祥
发明人
王成祥;王勇
分类号
A61G10/00
主分类号
A61G10/00
代理机构
代理人
主权项
1、高氧低温式颅脑损伤治疗装置,它有颅脑罩(2),其特征在于:颅脑罩(2)扣合在底板(12)上,颅脑罩(2)上分别设置有与其内腔相通的进氧口(3)、进冷口(1)、阀门(5),颅脑罩(2)上设置有开口(8)。
地址
250014山东省济南市文化东路54号公安专科学校法医教研室
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