发明名称 SUBSTRATE PROCESSING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate processing device, which assures sufficient vessels for housing a substrate without increasing the size of the device. SOLUTION: An FOUP rotary housing shelf 25 and its three-stage shelf 27 are rotatable about a revolution mechanism body 26. Two FOUPs 13, oriented in the same direction on the same straight line, are housed respectively, on each of three-stage shelf 27, on the front and rear of the revolving mechanism body 26. By an FOUP carrier 22, the FOUPs 13 are carried into the three-stage shelves 27 of the FOUP rotary housing shelf 25 so that they are on one straight line, while being oriented in the same direction with the FOUPs 13 oriented in the same direction on the same straight line carried out of the FOUP rotary housing shelf 25.</p>
申请公布号 JP2000311935(A) 申请公布日期 2000.11.07
申请号 JP19990119308 申请日期 1999.04.27
申请人 KOKUSAI ELECTRIC CO LTD 发明人 HAYASHI AKINARI;TANIYAMA TOMOSHI
分类号 H01L21/673;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/673
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