| 摘要 |
PROBLEM TO BE SOLVED: To provide an affixing plate with a was-free holding device that prevents maldistribution of water and has no influence upon the form of wafers during polishing by polishing machines. SOLUTION: In a polishing machine with a rotatable surface plate for polishing and a pressure plate, an affixing plate 11 for holding and pressing a workpiece surface against the surface of the polishing surface plate in parallel relation comprises an appreciably rigid and dense ceramics plate, one or more porous ceramics plates 15 having gas-and-water-permeabilities, and a backing pad 12 consisting of a layer 13 of soft foam and a collar 16. |
