MASK MATERIAL FOR EXPOSURE

摘要

PROBLEM TO BE SOLVED: To obtain a mask material for exposure excellent in fine image reproducibility and capable of easily forming a mask for exposure. SOLUTION: The mask material has at least a silver halide emulsion layer and a physical developing nucleus layer on a glass substrate, has the physical developing nucleus layer between the glass substrate and the silver halide emulsion layer, forms a metal silver image having <=1μm thickness on the glass substrate by physical development and provides a maximum optical density of >=1.0 to the metal silver image. Preferably the thickness of the metal silver image is <=0.5μm, water-soluble gelatin does not substantially remain and a layer based on a metal oxide, preferably titanium dioxide is present between the glass substrate and the physical developing nucleus layer.