| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for forming an electron source capable of conducting a deposition treatment for a short time without receiving limit of an impressed voltage wave. SOLUTION: This is a method for manufacturing an electron source which a plurality of electron emitting elements are wired with a plurality of column direction wirings and row direction wirings in a matrix. Here, m (m=a×b×c) of the row direction wirings are divided into (a) pieces of groups G1-Ga. The row direction wirings in each group are further divided into (b) pieces of subgroups SG1-SGb having (c) pieces of the row wirings. The row direction wirings of SG1 in each group are sequentially selected common in each group and applied with voltage to conduct a deposition treatment. Similarly, subgroups after SG2 are conducted by the deposition treatment. The deposition treatment for each subgroup is conducted at (b) times to conduct the deposition treatment for the entire elements.</p> |
