| 摘要 |
PROBLEM TO BE SOLVED: To realize a manufacturing device and a method, where a silicon oxide film large in area and highly uniform in quality can be formed. SOLUTION: A silicon oxide film manufacturing device is equipped with a substrate-holding means which vacuum-chucks a substrate 1 and a heating means which heats the substrate 1. In this case, the substrate-holding means has a plurality of suction grooves 5, 6, and 7, and the grooves 5, 6, and 7 can each be set adjustable in level of suction vacuum.
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