发明名称 COMPOSITION FOR REMOVING ITO FILM AND METHOD FOR REMOVING ITO FILM USING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain a compsn. capable of efficiently removing an ITO film without practically corroding a metal of a metal mask, or the like, even in the case the ITO film lies on the metal by composing it of one or more kinds of acids of the group consisting of hydrochloric acid, phosphoric acid and carboxylic acid respectively of specified concns. as essential components and a surfactant. SOLUTION: This compsn. is composed of an aq. soln. contg. one or more kinds of acids selected from the group consisting of 0.5 to 15 wt.% hydrochloric acid, phosphoric acid and carboxylic acid by 0.5 to 15 wt.% and 0.01 to 5 wt.% surfactant. Moreover, it is composed of an aq. soln. contg. polyamine and/or the hydrochloride thereof by 0.1 to 5 wt.%. The carboxylic acid is the one of one or more kinds selected from the groups consisting of formic acid, acetic acid, lactic acid and oxalic acid, and the polyamine and/or the hydrochloride thereof is the one of one or more kinds of the groups consisting of polyacrylamine, polyallylamine and polyvinyl pyridine respectively having 10000 to 100000 weight average molecular weight.
申请公布号 JP2000309888(A) 申请公布日期 2000.11.07
申请号 JP19990114900 申请日期 1999.04.22
申请人 ASAHI DENKA KOGYO KK 发明人 YAJIMA AKIMASA;IKEDA KIMIHIKO
分类号 C09K13/04;C09K13/06;C23F1/00;C23F1/44;(IPC1-7):C23F1/00 主分类号 C09K13/04
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