发明名称 |
On-chip ESD protection in dual voltage CMOS |
摘要 |
In a split gate process for dual voltage chips, the N-type high-voltage transistors which are part of the ESD protection circuit, and therefore have the thicker gate oxide of the high-voltage transistors, can receive channel doping and drain extender doping which is the same as the core transistors. This causes these transistors to develop a high substrate current during an ESD event, triggering the protection circuit.
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申请公布号 |
US6143594(A) |
申请公布日期 |
2000.11.07 |
申请号 |
US20000491604 |
申请日期 |
2000.01.26 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
TSAO, ALWIN J.;GUPTA, VIKAS I.;BALDWIN, GREGORY C.;AMERASEKERA, E. AJITH;SPRATT, DAVID B.;ROST, TIMOTHY A. |
分类号 |
H01L27/02;(IPC1-7):H01L21/823 |
主分类号 |
H01L27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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