发明名称 |
Method for making nanoporous silicone resins from alkylydridosiloxane resins |
摘要 |
A method for preparing a nanoporous silicone resin which can be used to form low dielectric constant films useful for electrical insulating coatings on electronic devices comprising (A) contacting a hydridosilicon containing resin with a 1-alkene comprising about 8 to 28 carbon atoms in the presence of a platinum group metal-containing hydrosilation catalyst effecting formation of an alkylhydridosiloxane resin where at least 5 percent of silicon atoms are substituted with at least one group comprising about 8 to 28 carbon atoms and at least 45 percent of silicon atoms are substituted with at least one hydrogen atom and (B) heating the alkylhydridosiloxane resin of step (A) at a temperature sufficient to effect curing and thermolysis of alkyl groups comprising about 8 to 28 carbon atoms from the silicon atoms thereby forming a nanoporous silicone resin.
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申请公布号 |
US6143360(A) |
申请公布日期 |
2000.11.07 |
申请号 |
US19990458739 |
申请日期 |
1999.12.13 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
ZHONG, BIANXIAO |
分类号 |
B05D3/02;B05D7/24;C08G77/02;C08J9/02;C09D183/04;C09D183/05;H01L21/312;H01L21/316;(IPC1-7):B05D5/00 |
主分类号 |
B05D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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