| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a CVD chamber gas supply device comprising an injection valve, which can clean residues easily and at low cost and prevents clogging in the valve. SOLUTION: An injection valve 41a is connected with a carrier gas inlet 15, a treatment liquid inlet 13 and outlets 17 and ultrasonic vibrations are imparted on an evaporation region 21 for producing a mixed treatment gas and are directly exerted on an injection block 26 or are exerted on the block 26 via a wave generator 25 and a piezoelectric actuator 23, whereby the residues are removed from the injection valve 41a, and clogging is prevented from generating in the valve 41a.</p> |
