| 摘要 |
PROBLEM TO BE SOLVED: To obtain a plasma treatment apparatus capable of uniformly exhausting a treatment chamber, while keeping a susceptor movable in the vertical direction. SOLUTION: A plasma treatment apparatus 100 is equipped with a lift member 142 connected to a susceptor 104, a bellows 134 provided to the base of a processing chamber 102 and capable of keeping the chamber 102 at a reduced pressure, a lift device 136 which is connected to the lift member 142 that extends outward from the base of the processing chamber 102 through the intermediary of a bellows 134 and capable of raising or lowering the susceptor 104 by raising or lowering the lift member 142, and a high-vacuum pump 108 connected to the base of the processing chamber 102 substantially directly underneath the susceptor 104.
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