| 摘要 |
PROBLEM TO BE SOLVED: To obtain a focusing ring, which does not generate particles, even though cleaning using a corrosive gas, such as fluorine gas, is performed on the focusing ring. SOLUTION: This focusing ring 1 which is used for a plasma device and the focusing ring 1 has a ceramic film 3, formed through a chemical vapor deposition method on its surface. The manufacturing method of the focusing ring 1, which is used for the plasma device, is a method wherein the ceramic film 3 is formed on a circular ring-shaped base material 2 by the chemical vapor deposition method to manufacture the ring 1.
|
