发明名称 Semiconductor memory device having stack-type memory cells and a method for manufacturing the same
摘要 At least one dummy storage node is formed for a plurality of storage nodes provided in stack type memory cells in which a plate electrode is grounded through the at least one dummy storage node, thereby charges flowed into the plate electrode being discharged, when dry etching is performed by using charged particles, thus preventing electrical stress from acting on a capacitor dielectric film provided between the storage nodes and the plate electrode.
申请公布号 US6144074(A) 申请公布日期 2000.11.07
申请号 US19980196548 申请日期 1998.11.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 AKITA, HIRONOBU
分类号 H01L27/108;H01L21/8242;H01L23/60;H01L23/62;(IPC1-7):H01L23/62;H01L29/00;H01L21/824 主分类号 H01L27/108
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