Barrier layer decreases nitrogen contamination of peripheral gate regions during tunnel oxide nitridation
摘要
This invention describes methods for producing gate oxide regions in periphery regions of semiconductor chips, wherein the gate oxide regions have improved electrical properties. The methods involve the deposition of a barrier layer over the periphery of the semiconductor chip to prevent the introduction of contaminating nitrogen atoms into the periphery during a nitridation step in the core region of the semiconductor chip. By preventing the contamination of the gate areas of the periphery, the gate oxide regions so produced have increased breakdown voltages and increased reliability. This invention describes methods for etching the barrier layers used to protect the periphery from tunnel oxide nitridation. Semiconductor devices made with the methods of this invention have longer expected lifetimes and can be manufactured with higher device density.
申请公布号
US6143608(A)
申请公布日期
2000.11.07
申请号
US19990283308
申请日期
1999.03.31
申请人
ADVANCED MICRO DEVICES, INC.;FUJITSU LIMITED
发明人
HE, YUE-SONG;HIGASHITANI, MASAAKI;FANG, HAO;DERHACOBIAN, NARBEH;COX, BILL;CHANG, KENT;KO, KELWIN;CHOW-CHAN, MARIA