发明名称 Carrier head with a retaining ring for a chemical mechanical polishing system
摘要 A carrier head for chemical mechanical polishing with a retaining ring having an inclined inner surface. The force of the edge of the substrate against the inclined surface causes a reactive force having a vertical component on the edge of the substrate. This vertical force can reduce the edge effect.
申请公布号 US6143127(A) 申请公布日期 2000.11.07
申请号 US19980079009 申请日期 1998.05.14
申请人 APPLIED MATERIALS, INC. 发明人 PERLOV, ILYA;GANTVARG, EUGENE
分类号 B24B37/04;B24B41/06;H01L21/304;(IPC1-7):B24B5/00;B24B29/00 主分类号 B24B37/04
代理机构 代理人
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