摘要 |
The invention concerns a device for treating with microwave plasma a container, characterised in that the container is placed in a chamber (12) made of a conductive material and is rotationally symmetrical, and the device comprises a wave guide tunnel (15) substantially perpendicular to the axis (A1) of the chamber and which emerges therein in the form of a rectangular window whereof the smaller dimension corresponds to its dimension along the chamber axis, and the internal diameter of the chamber (12) is such that the microwaves are propagated in the chamber mainly according to a mode whereby the electric field resulting from the propagation of the microwaves exhibit an axial rotational symmetry.
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