发明名称 OPTICAL MONITOR AND FILM FORMATION SYSTEM ACCOMPANIED BY THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain an optical monitor which can measure optical characteristics of an optical thin film obtained by a film forming device with high precision right after the film formation and a film formation system accompanied by it. SOLUTION: The light of a light source LUM passes through a Y type optical fiber OPYF. One branching light OPYF-R has an optical path 1 for transmissivity measurement and the other OPYF-L has an optical path 2 for light source measurement. The optical paths 1 and 2 are connected to a shutter part MS and the light passing through one of the optical path is selected and supplied to an optical demultiplexer SP. An arithmetic processing part PC is able to detect and control the state of the shutter part MS and processes the data from the optical demultiplexer SP according to the selection state of the shutter part MS. The arithmetic processing part PC when measuring the quantity of light of the optical path 1 inputs as a correction data component the variation of the optical path 2, i.e., the light source LUM by directly monitoring and measuring it and applies it for the correction of the light quantity measurement of the optical path 1.
申请公布号 JP2000304902(A) 申请公布日期 2000.11.02
申请号 JP19990109187 申请日期 1999.04.16
申请人 SONY CORP 发明人 HONJO TEIJI
分类号 G01N21/55;C23C14/54;C23C16/52;G01M11/00;G01N21/59;G02B1/10;G02B5/08 主分类号 G01N21/55
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