发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To reduce wafer processing time and improve the throughput by providing a plurality of pins on a stage for setting a wafer thereon, and providing the pins with a function of supporting and changing the position of the wafer which floated from the stage. SOLUTION: A stage 5 for setting a wafer 11 thereon is arranged at a lower portion within a container 1. The stage 5, which is rotated by a control section 6, is provided with a plurality of pins 10 that have the function of opening and closing the wafer 11 that is in a floated state from the stage 5. For closing the wafer 11, the pins 10 can support the wafer 11, and for opening the wafer 11, they can move to a position where they move away from the wafer 11, whereby the pins 10 allow the wafer 11 to be replaced with another wafer. As a result of this arrangement, the pins 10 can be opened and closed while the rotating wafer 11 is being cleaned, and thus the time required for causing the pins to replace the wafer 11 with another can be reduced.</p>
申请公布号 JP2000306877(A) 申请公布日期 2000.11.02
申请号 JP19990117690 申请日期 1999.04.26
申请人 HITACHI LTD;HITACHI ULSI SYSTEMS CO LTD 发明人 FUTASE TAKUYA;ITO MASAKI;SAEKI TOMONORI
分类号 H01L21/683;H01L21/205;H01L21/304;H01L21/68;(IPC1-7):H01L21/304 主分类号 H01L21/683
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