| 摘要 |
The invention relates to a chamber for chemical vapour deposition, consisting of an inner quartz tube (1) which is enclosed by a shorter, outer quartz tube. Each end of the inner quartz tube (1) is surrounded by a first flange (3), which presents a groove (3') which extends in the longitudinal direction of the inner quartz tube (1) and in which in each case the face end of the inner quartz tube (1) is positioned. A seal (5') is arranged between the first flange (3) and the outside of the inner quartz tube (1). On both first flanges (3) a second flange (4) is positioned in the direction of the tube centre which comprises a peripheral rim (4') for fixing the face end of the shorter, outer quartz tube (2) and contacts both the outside of the inner quartz tube (1) and the outside of the shorter, outer quartz tube (2). A seal (5) is positioned between the second flange (4) and the outside of the shorter, outer quartz tube (2). At least one second flange (4) comprises at least one connection (14) which can be closed and is connected to the space between the shorter, outer quartz tube (2) and the inner quartz tube (1). Each first flange (3) and each second flange (4) on the inside each have a cooling channel (8, 8') which in each case presents at least one inlet and one outlet for a coolant.
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