Photomask material, used to produce printed circuit boards, liquid crystal displays or large scale integrated circuits, has glass substrate with physical development center layer covered by silver halide emulsion

摘要

Photomask materials having a glass substrate with a physical development center layer covered by silver halide (AgX) emulsion layer, giving a metallic silver (Ag) image with a thickness /- 1 micro m and maximum optical density <= 1.0, is new. Independent claims are also included for the following: (1) processing the novel material; and (2) photomasks produced from the novel material.