发明名称 APPARATUS AND METHOD FOR MEASUREMENT OF EMISSION GAS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus by which the distribution of a deposit or an adsorbed gas is measured precisely, simply and quickly without damaging a material to be measured and to provide a method in which the distribution is measured precisely, simply and quickly. SOLUTION: A holding device 7, which holds a material 6 to be measured so as to be freely movable, is installed inside an airtight measuring chamber 1, in which a vacuum evacuation means and a gas-amount measuring means such as a mass spectrometer or the like are provided. A laser light source 9, which irradiates the surface of the material 6 to be measured, is installed outside the measuring chamber 1. By using this measuring apparatus, the material 6 to be measured is irradiated intermittently with a laser beam while an irradiation position to the material 6, to be measured, from the laser light source 9 is being changed. A change in a pressure inside the measuring chamber until the next irradiation of the laser beam from its irradiation is measured by the gas-amount measuring means.
申请公布号 JP2000304724(A) 申请公布日期 2000.11.02
申请号 JP19990109764 申请日期 1999.04.16
申请人 ULVAC JAPAN LTD 发明人 SAITO KAZUYA;HARA YASUHIRO;HOSHINO YOICHI;INAYOSHI SAKAE
分类号 G01N27/62;G01N1/28;H01L21/66;(IPC1-7):G01N27/62 主分类号 G01N27/62
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