| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas-supplying apparatus for a plasma treatment apparatus, which is provided with a plate having holes in an extremely small diameter for ionization and can supply a gas flow uniformly to a large area. SOLUTION: There are provided a gas inlet, a plenum space and a gas supplying plate 18 or manifold, which has an array of holes and extends across an end portion in the downstream of the plenum space. In this gas supplying apparatus for a plasma treatment device, the gas supplying apparatus is further provided with a separate plate 19 for ionization, adjacent downstream side of the gas supplying plate 18. The plate 19 for ionization is provided with apertures arrayed, corresponding to respective holes in the gas-supplying plate 18. |
