| 摘要 |
PROBLEM TO BE SOLVED: To accurately manage the point of baking ending time in a baking process which is performed for baking a resist, antireflection film, etc. SOLUTION: While a white light beam is projected perpendicularly upon a resist film 15 applied to a wafer 13, the reflected light of the light beam from the film 15 is split spectrally into split light rays by means of a grating 22, and the split light rays are received by means of a light receiving element 23, such as CCDs, etc. The quality of the resist film 15 is detected from the spectral characteristics of the reflected light rays received by means of the light receiving element 23. The quality of the film 15 is detected while the film 15 is baked, and when an aimed quality is detected, the baking is terminated. |
