| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain an optical waveguide element having patterned epitaxial oxide thin-film optical waveguides by causing the solid phase epitaxy growth of patterned amorphous thin films by heating the thin films. SOLUTION: After the amorphous thin film is formed on the surface of a single crystal substrate, this amorphous thin film is patterned to a projecting shape by etching. The solid phase epitaxy growth of the patterned amorphous thin films is then caused by heating the thin film, to form the patterned epitaxial oxide thin-film optical waveguides. The optical waveguide element formed in the manner described above is indicated by the constitution consisting of a substrate 1, an epitaxial buffer layer 2, an epitaxial slab type optical waveguide 3, an epitaxial linear channel optical waveguide 4, edges 5 of the optical waveguide and an incident end 6. As a result, the optical waveguide element having excellent characteristics can be obtained with good productivity.</p> |
