| 摘要 |
PROBLEM TO BE SOLVED: To form a thin film with a high adhesion force to a substrate without changing the substance structure of an amino acid by performing heating and sublimation under a vacuum using a molecular beam cell that is composed of a heater and a water-cooling jacket. SOLUTION: After forming fine powder, a fully dried amino acid is filled into a crucible 20 that is composed of a heater 21, a water-cooling jacket 22, and the like being provided at a molecular beam deposition cell 3. After a vacuum container 1 is set to a high vacuum state of 10-7 Torr order by a turbo molecular pump exhaust system, the temperature of the crucible 20 is increased to a temp. of 0 to 240 deg.C, and the amino acid is sublimed, thus starting deposition. The degree of vacuum during deposition is generally in the order of 10-4 Torr, and all raw materials are normally deposited within two hours. Then, during deposition, a plasma flow is operated for increasing the adhesion property with the substrate. However, by controlling power being thrown into plasma, a target thin film is obtained.
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