发明名称 Large area vacuum laser beam processing apparatus, e.g. for micro structuring semiconductor wafer surfaces, has a rotating window disk sealed by an O-ring seal and provided with a smaller window
摘要 Large area vacuum laser beam workpiece processing apparatus, comprises a relatively rotating circular window plate (2) sealed by an O-ring seal and provided with a smaller window (3). The parent patent (DE19801612) claims a large area vacuum laser beam workpiece processing apparatus, comprising a work chamber with top and bottom plates, one or more lasers, laser beam guiding and shaping devices, a gas supply system, a vacuum generator and a drive system, the chamber top plate having a small opening. In this patent of addition, the novelty is that: (a) a circular window plate (2) is freely and/or rotationally mounted on the top plate (4) which has a circular opening (6); (b) a projecting O-ring seal is fitted in a top plate or window plate groove (7) around the opening (6) between the top plate and the window plate so the window plate completely covers the O-ring seal; (c) a smaller window (3) is provided in the window plate within the O-ring seal; and (d) the window plate and/or the work chamber (1) is connected to the drive.
申请公布号 DE19918802(A1) 申请公布日期 2000.11.02
申请号 DE1999118802 申请日期 1999.04.26
申请人 EBERT, ROBBY;REISE, GUENTER;EXNER, HORST 发明人 EBERT, ROBBY;REISE, GUENTER;EXNER, HORST
分类号 B23K26/12;C23C16/48;(IPC1-7):B23K26/12;C23C14/22 主分类号 B23K26/12
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