EGUIPMENT FOR FABRICATING OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A mask for forming pattern in measurement is provided to have the same condition to that in a chip region. CONSTITUTION: A mask for forming pattern in measurement includes the first region(10) of a rectangle shape for forming an active region of the semiconductor device. The outer side of the first region(10) is the second region(20) corresponding to a device isolation region of the semiconductor device. A plurality of wire region(30) for forming a plurality of wires of the semiconductor device are formed over the first region(10) and the second region(20) in a longitudinal direction. The wire region(30) can be arranged by changing the width(L4) of the wire and the distance(L5) between the wires with a pitch defined to be the sum of the width and the distance of the wire constant. The length(L3) of the wire region(30) at both sides overlapping with the second region(20) can be formed to be same or different to each other.